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FUJIFILM Wako Chemical Hiratsuka Plant
FUJIFILM Wako Chemical Hiratsuka Plant
class Hiratsuka, Kanagawa Pref.
Site area 36,000 m2
Number of employees 300 people
Beginning of operation 1961
Certification ISO9001, ISO14001
Various different multipurpose facilities
Possible to realize small quantity / large variety production of chemicals from several kilo grams to several tons
Ultra-low-temperature tanks, Teflon-lined tanks, and kilolab facilities
Main facilities
Scale of reaction facilities:40 – 6,000 L (GL, SUS, Teflon)
Reactor:High-pressure reduction tank (autoclave), low-pressure reduction tank, high-temperature reactor (≤ 250°C), normal-pressure reactor (SUS, GL), and reactor for high-viscosity content (≤ 70,000 CP)
Solid – liquid separation:Centrifugal separator, filtration dryer, high-speed decanter, and cross-flow filtration device
Drying facilities:Double conical dryer, plate dryer, shelf-type vacuum dryer, and shelf-type dryer
Special facilities:Bottom-type distillatory, Sakuma-type concentrator, multistage distillatory, various granulators, various crushers, electrodialyser, dispersion apparatus, sulfonation facility, water-prohibitive substance handling facility, Teflon-lined tank for fluorine compounds, kilolab plant, and others